Crystalline Silicon/Perovskite PL/EL Integrated Tester

SC-PLEL-PS

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  • Product introduction

  • Crystalline Silicon/Perovskite PLEL All-in-One System SC-PLEL-PS

    Integrated EL and PL dual-mode luminescence inspection, covering crystalline silicon/perovskite/tandem cells, from R&D to mass production throughout the entire lifecycle.

    China's First Dual-Mode All-in-One System

    Crystalline Silicon/Perovskite PLEL All-in-One System is an innovative inspection device independently developed by Vision Potential. It integrates EL and PL dual-mode luminescence imaging capabilities, enabling synchronous benchmarking analysis of the same detection area and fully presenting the morphology and distribution of various defects. The device is equipped with a highly stable semiconductor laser light source (main wavelength 808±5nm, optional multi-band), paired with a high-sensitivity NIR camera, achieving high-resolution imaging of ≥0.1mm/pixel.

    Covers crystalline silicon cells (PERC/TOPCon/HJT/xBC), single-junction perovskite cells, and tandem cells, supporting raw material control, process monitoring, finished product grading, and R&D innovation, providing quantitative data support for photovoltaic technology iteration.

    Vision Potential Crystalline Silicon/Perovskite PL/EL All-in-One System            SC-PLEL-PS Device Diagram

    1000×900×1600mm | Approx. 200kg

    Applications

    Crystalline Silicon Cells

    Crystalline Silicon PERC/TOPCon/HJT/xBC

    Single-Junction/Flexible Perovskite

    Single-Junction/Flexible Perovskite

    Crystalline Silicon-Perovskite Tandem

    Crystalline Silicon-Perovskite Tandem

    01

    Raw Material Quality Control

    Analyze crystal structure and impurity distribution via PL, eliminate defects at the source, and reduce rework costs.

    02

    Full-Process Process Monitoring

    Capture defects caused by process fluctuations, provide quantitative data to support parameter adjustments, and ensure stable product quality.

    03

    Finished Product Inspection & Grading

    Comprehensively inspect defects and evaluate performance, achieve product grading, ensure compliance with industry standards, and avoid downstream application risks.

    04

    R&D Innovation Support

    Provide quantitative data for high-efficiency cell technology iteration and defect mechanism research, accelerating new technology industrialization.

    Functions

    Functional Advantages

    A1

    Dual-Mode Imaging · Synchronous Analysis

    EL locks onto current blocking areas caused by cracks; PL identifies non-radiative recombination centers at grain boundaries, fully presenting defect morphology and distribution.

    A2

    Automated Control

    Intelligent control of cylinders/motors for automatic transport, position calibration, and lifting, significantly enhancing inspection efficiency and result repeatability.

    A3

    Multi-Wavelength Light Source

    808±5nm standard, optional 450/915/980nm; spot uniformity ≥90%, power adjustable 0.1~2 suns, precisely matching various cell excitation requirements.

    A4

    High-Resolution Imaging

    NIR-enhanced camera, max frame rate 4.5FPS, imaging accuracy ≥0.1mm/pixel, capturing subtle defects.

    A5

    Quantitative Parameter Analysis

    Proprietary algorithms analyze minority carrier diffusion length, lifetime (accuracy ±0.1μs, τ≤10μs), outputting IVoc, Jo, τ, Rs Mapping.

    A6

    High-Precision Programmable Power Supply

    Constant current/voltage dual modes, voltage 030V (±1%), current 010A (±1%), precisely meeting different cell bias requirements.

    Inspection Efficiency: ≤15 seconds per piece, suitable for full-process quality control in industrial mass production, quickly screening unqualified products and reducing subsequent packaging costs.

    Auxiliary Functions · Intelligent Analysis Software

    • ·                            Image Processing: Multiple adjustment methods and format saving

    • ·                            Data Management: Automatic report generation and traceability

    • ·                            Precise Observation: Cursor tracking and local statistics

    • ·                            Intelligent Analysis: Automatic defect classification, MES interface

    • ·                            Generate Mapping Graphs: IVoc, Jo, τ, Rs, etc.

    • ·                            From Qualitative to Quantitative: Intuitive performance distribution display

    • ·                            Suns-Voc Analysis, recombination study

    Vision Potential ELPL All-in-One System Imaging Image 1

    Vision Potential ELPL All-in-One System Imaging Image 2

    Vision Potential ELPL All-in-One System Suns-Voc Curve

    Core Technical Parameters

    Parameter Specification
    Model SC-PLEL-PS
    Camera Specifications NIR enhanced, 25MP, exposure 10μs~30s, response 400-1200nm
    Infrared Pixels 500~2500万像素
    Lens Specifications HD wide-angle 8/16/25mm optional, FOV ≥80°
    Light Source Specifications Semiconductor laser, main wavelength 808±5nm (optional 450/915/980nm)
    Spot Uniformity ≥90% (within effective detection area)
    Detection Cycle 12μs~10000ms, step 1ms adjustable
    Detection Wavelength Range 9001300nm (Crystalline Si), 700900nm (Perovskite)
    Detectable Defect Types Cracks, broken grid, fragments, scratches, cold solder, over-etching, black spots, concentric circles, low-efficiency cells, contamination, etc.
    Probe Configuration 2~6 sets of pins, adjustable pitch, pure copper gold-plated (customizable)
    Stage Size 50×50mm ~ 230×230mm (larger customizable)
    Control Method Proprietary software fully automated control
    Detection Accuracy Crack width > 50μm detectable
    Imaging Accuracy ≥0.1mm/pixel
    Focus Mode / Distance Manual focus / 130-650mm
    Hardware Mount Aluminum profile, sheet metal, etc.
    Inspection Time 0.1s~10s (automatic based on object)
    Test Platform Windows platform
    Constant Current/Voltage 010A adjustable, accuracy ±1% / 030V adjustable, accuracy ±1%
    Power 1000-2000W
    Power Supply Protection Reverse current, overload, leakage, ESD, overheat protection
    Computing Device Industrial computer
    Inspection Objects Crystalline Si cells, single-junction Perovskite cells, Crystalline Si-Perovskite tandem cells (bare, with film, packaged)
    Ambient Temperature 15-50℃, Humidity 30%-70% (non-condensing)
    Equipment Weight Approx. 200kg (actual product prevails)
    Dimensions 1000×900×1600mm (L×W×H, actual product prevails)
    Power Supply Single-phase AC220V±10%, 50HZ±1HZ

    Application Cases · Multi-Material Imaging Comparison

    Inspection Type Inspection Object B&W Imaging False Color Imaging Imaging Analysis
    PL (Photoluminescence) Crystalline Silicon Cell PL-image-01 PL-image-02 Evaluate crystal quality and carrier lifetime via PL signal intensity: bright areas indicate good crystallization and long lifetime, dark lines/areas indicate cracks, metal impurities, etc.
    Perovskite Cell PL-image-03 PL-image-04 Analyze film uniformity and defect state density: dark spots correspond to defect-rich areas or interface recombination centers.
    Perovskite Tandem - Perovskite Layer PL-image-05 PL-image-06 Focus on intrinsic properties and interface matching of the perovskite layer; abnormal luminescence decay indicates high interface state density.
    Perovskite Tandem - Crystalline Si Layer PL-image-07 PL-image-08 Targeted detection of cracks, contamination in the crystalline Si layer, quantify carrier lifetime, assess tandem structure impact.
    EL (Electroluminescence) Crystalline Silicon Cell EL-image-01 EL-image-02 Identify electrode contact abnormalities and carrier transport; dark areas may indicate cracks or broken grid.
    Perovskite Cell EL-image-03 EL-image-04 Identify defect types and current distribution uniformity; dark spots indicate scribing deviations, cracks, or bad cells.
    Perovskite Tandem - Perovskite Layer EL-image-05 EL-image-06 Evaluate interlayer compatibility and current matching; abnormal luminescence indicates carrier injection/extraction obstacles.
    Perovskite Tandem - Crystalline Si Layer EL-image-07 EL-image-08 Analyze crystalline Si layer electrode contact and overall synergy, avoid local current crowding leading to efficiency loss.

    Core Inspection Capabilities

    Detects minority carrier diffusion length, minority carrier lifetime (accuracy ±0.1μs), micro-cracks/broken grid/black spots/concentric circles and other defects.

    Supports IVoc, Jo, τ, Rs Mapping quantitative analysis, automatic report generation and traceability.

    Gold-plated probe design, 2~6 sets adjustable, adaptable to different grid line spacings.

    Non-contact, non-destructive inspection, suitable for both laboratory R&D and mass production quality control.

    Crystalline Si · Perovskite · Tandem Full Scenario Coverage

    University Research · Corporate R&D · Production Line QC · Finished Product Grading

    Dual-Mode Imaging · Synchronous Analysis            Quantitative Mapping · Full Defect Recognition

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